Consistently high quality and abundant flexibility: Drawing on our vast experience and in close contact with our customers, we manufacture high-purity mono- or multicrystalline sputtering targets that are a perfect fit for your project, because an ideal coating needs the right interaction of sputtering targets, cathode and the relevant individual parameters. We manufacture the sputtering targets individually for your specific application. In doing so, we tailor the exact configuration of the target in detail: Geometry, possibly a heat sink and back plate, and an optional appropriate bonding process permit specific target properties. Various individually tailored n-type and p-type doping processes – with boron (p-type) or phosphorus, arsenic and antimony (n-type), for instance – round off the configuration options – the fitting response to the increasingly individual demands being placed on functional coatings. We permanently monitor the quality of every single batch with a trained eye. The result: Silicon targets for absolutely uniform, durable coatings on a wide variety of materials – for specifically improved material properties or tailor-made functional layers. Typical areas of application include photovoltaics, the optical and optoelectronics industry, the semiconductor technology sector and sheet-glass manufacturing, but they are also used in many branches of research and development, such as for testing the characteristics of new material compositions or conducting scientific experiments.